China
will launch its first 28-nanometer homegrown lithography machine at the
year-end, representing a great leapfrog for the nation's chip industry
after years of US-led suppression and containment.
According to
the Securities Daily, Shanghai Micro Electronics Equipment Group (SMEE)
has been committed to developing a 28-nm immersion lithography machine,
and it's expected the first domestically produced SSA/800-10W
lithography machine will be delivered to the market by the end of 2023.
Founded
in 2002, SMEE is one of China's leading lithography machine makers and
accounts for about 80 percent of the domestic market, industry sources
said. Reuters described the company as China's only potential competitor
to the Netherlands' world-leading lithography machine maker ASML.
SMEE's
website noted that it has developed machines capable of manufacturing
chips at the 90-nm node standard - a technology that is suitable for
producing low-end chips.
He Rongming, vice chairman of SMEE, said
that in 2002 when Chinese experts went abroad for inspections, some
foreign engineers said: "Even if we gave you all the blueprints, you
might not be able to produce a lithography machine," according to the
Securities Daily report.
After returning to China, He led the
team in five years of research and development, and the team achieved a
major breakthrough in the crucial exposure process.
The
28-Nanometer achievement comes at a critical time when the US has
persuaded its allies, including Japan and the Netherlands, to join in
its effort to contain China's tech sector growth.
Anonymous